A photoresist spin-coating instrument

Date

4-1996

Degree

Bachelor of Science in Applied Physics

College

College of Arts and Sciences (CAS)

Adviser/Committee Chair

Demetrio A Yco, Jr.

Abstract

A simple spin-coating instrument for coating photoresist on a wafer was designed and implemented. Different samples of viscosity of the photosensitive fluid were obtained through evaporation. The different samples of viscosity of the photosensitive fluid were then introduced into the surface of the wafer under different values of angular velocity of the spin-coater. The coating thickness which resulted from the spin-coating of the different samples of viscosity of the photosensitive material on the wafer were calculated using the obtained mass of the deposit. The data were then plotted and two graphs were obtained. The first is the graph of the mass of the coating against the angular velocity of the spin-coater for the different samples of viscosity. The second is the graph of thickness of the coating against the angular velocity of the spin-coater for the different samples of viscosity. Using regression analysis and different numerical methods, the data gathered were tested for a possible mathematical model.

Language

English

Location

UPLB Main Library Special Collections Section (USCS)

Call Number

Thesis

Document Type

Thesis

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