A photoresist spin-coating instrument
Date
4-1996
Degree
Bachelor of Science in Applied Physics
College
College of Arts and Sciences (CAS)
Adviser/Committee Chair
Demetrio A Yco, Jr.
Abstract
A simple spin-coating instrument for coating photoresist on a wafer was designed and implemented. Different samples of viscosity of the photosensitive fluid were obtained through evaporation. The different samples of viscosity of the photosensitive fluid were then introduced into the surface of the wafer under different values of angular velocity of the spin-coater. The coating thickness which resulted from the spin-coating of the different samples of viscosity of the photosensitive material on the wafer were calculated using the obtained mass of the deposit. The data were then plotted and two graphs were obtained. The first is the graph of the mass of the coating against the angular velocity of the spin-coater for the different samples of viscosity. The second is the graph of thickness of the coating against the angular velocity of the spin-coater for the different samples of viscosity. Using regression analysis and different numerical methods, the data gathered were tested for a possible mathematical model.
Language
English
Location
UPLB Main Library Special Collections Section (USCS)
Call Number
Thesis
Recommended Citation
Buenaventura, Jason D., "A photoresist spin-coating instrument" (1996). Undergraduate Theses. 10323.
https://www.ukdr.uplb.edu.ph/etd-undergrad/10323
Document Type
Thesis