Effect of bias voltage on the morphological characteristics of ZnO film via electrochemical deposition.

Date

10-2011

Degree

Bachelor of Science in Applied Physics

College

College of Arts and Sciences (CAS)

Adviser/Committee Chair

Alexandra B Santos

Co-adviser

Darwin B Putungan

Abstract

The Effect of Bias Voltage on the Morphological Characteristics of ZnO film via Electrochemical Deposition Thesis Adviser: Ms. Alexandra B. Santos Thesis Co-adviser: Prof. Darwin B. Putungan The effect of bias voltage on the morphological characteristic of Zinc Oxide (ZnO) film via electrochemical deposition (ECD) was investigated. ZnO film was deposited with different applied voltage of -5V, -3V, -I V, 1 V, 3V, and 5V on Si substrate using ECD. The electrolyte used was composed of 0.IM KCI and 5mM ZnCl2. Other parameters including 90 minutes deposition time, 0.8cm electrode distance separation, concentration of the electrolyte, 70°C bath temperature were held constant for every sample. X-Ray Diffraction (XRD) revealed peaks that correspond to the wurtzite structure of ZnO. Silicon (Si) and zinc (Zn) peaks were seen on -3V, and 5V. Scanning electron microscopy (SEM) images revealed ZnO film deposited that increases with applied voltage. Mean grain sizes deposited atop the film were found to increase with the applied voltage.

Keywords: 11-/V Semiconductors (81.05.D2); Electrodeposition and electro dissolution (82.45.Qr); Electrodeposition, electroplating (81.15.Pq)

Language

English

Location

UPLB Main Library Special Collections Section (USCS)

Call Number

Thesis

Document Type

Thesis

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