Effect of pH level and deposition time on the formation of zinc oxide microspheres on silicon (100) fabricated by chemical bath deposition

Date

10-2011

Degree

Bachelor of Science in Applied Physics

College

College of Arts and Sciences (CAS)

Adviser/Committee Chair

Alexandra B Santos

Committee Member

Darwin B Putungan

Abstract

Zinc oxide (ZnO) microspheres were fabricated by chemical bath deposition on Silicon (100) substrate using Zinc chloride (ZnC12) and Carbamide ((NH2)2C0) as the starting materials. The solution for bath deposition was composed of 1.0 M (NH2)2C0 and 0.05 M of ZnC12. The pH level of each of the solution was varied (pH=3,4 and 5) by adding Hydrochloric acid (HCI). The substrates were then placed on the solutions which were kept at 80°C for 3, 6 and 24 hrs deposition times. The deposits were transformed into ZnO by heating it at 300°C for 30 mins. The structural and morphological properties of deposits were investigated using XRD and SEM, respectively. The XRD confirmed the crystalline structure of the deposit as ZnO with one significant peak at (201) plane for all pH levels under study. SEM images showed that ZnO microspheres were formed at pH 4 and pH 5 while irregularly shaped ZnO were formed at pH 3. The mean diameter of ZnO microspheres of pH 3 is significantly less than of the mean diameters of pH 4 and of pH 5 which are equal. On the other hand, the mean diameter of the ZnO microspheres increases as the deposition time increases.

Language

English

Location

UPLB Main Library Special Collections Section (USCS)

Call Number

Thesis

Document Type

Thesis

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