A new technique in polishing Indium Antimonide (InSb) under the influence of rotating fluid
Date
4-1996
Degree
Bachelor of Science in Applied Physics
College
College of Arts and Sciences (CAS)
Adviser/Committee Chair
Demetrio A Yco, Jr.
Abstract
A new technique has been developed for polishing Indium Antimonide (InSb). The rotating fluid serves as the medium acting on the surface of the substrate. Bromine-methanol solutions serve as etchants in polishing the samples. The effect of varying the angular speed of the fluid with etching/polishing rate was investigated. Relationship of changing the concentrations of bromine in methanol solution with the etching/polishing rate was also determined. The result shows that as the angular speed of the fluid increases, the etching / polishing rate also increases. Also , it has been found out that the higher the concentration of Br-MeOH used, the faster the etching/ polishing rate. The new method has produced a more or less flat surface as tested under the stereomicroscope. The best polished sample is produced on a rotating fluid with angular speed equal to 89.1 rpm and a concentration of 1.5 % Br-MeOH. Qualitatively, the new technique is considered to be an effective method in polishing semiconductor such as InSb.
Language
English
Location
UPLB Main Library Special Collections Section (USCS)
Call Number
Thesis
Recommended Citation
Petoral, Rodrigo M., "A new technique in polishing Indium Antimonide (InSb) under the influence of rotating fluid" (1996). Undergraduate Theses. 10479.
https://www.ukdr.uplb.edu.ph/etd-undergrad/10479
Document Type
Thesis