Temperature measurement and control system for a thin-film substrate holder

Date

4-1993

Degree

Bachelor of Science in Applied Physics

College

College of Arts and Sciences (CAS)

Adviser/Committee Chair

Demetrio A Yco, Jr.

Abstract

Since substrate temperature is widely considered to be one of the three vital factors to successful thin-film growth, a mechanical and electronic system is developed to enable the substrate holder's temperature to be monitored and controlled in vacuum ambience. A type-k thermocouple monitor is devised using a cold-junction compensator electronic circuit that have a tolerance of 1.7.27% within temperature ranges from room temperature up to 400°C. Temperature control is accomplished by tungsten resistive heating of the holder, which is in intimate contact with the heater. A characteristic temperature - current relationship is obtained in the form of T K12 + Tamb where K is a constant for equal time interval and is equal to 0.84°C/amp2 for the particular substrate holder used and Tamb is the ambient temperature measured just before the known constant current I is applied to the heater. It is another form of energy conservation law and it is assumed to hold beyond 100°C. Such a relationship now gives the temperature of the substrate holder in terms of the applied constant electric current. Also, it can help in the design of a power supply needed for the substrate holder to attain a required substrate temperature beyond 100°C for thin-film growth as well as substrate annealing.

Language

English

Location

UPLB Main Library Special Collections Section (USCS)

Call Number

Thesis

Document Type

Thesis

This document is currently not available here.

Share

COinS