Antibacterial activity of CUO-ZNO films fabricated via electrophoretic deposition against Escherichia Coli

Date

4-2014

Degree

Bachelor of Science in Applied Physics

College

College of Arts and Sciences (CAS)

Adviser/Committee Chair

Eufrocinio DC. Marfori

Abstract

The anti-bacterial activity of the different CuO-ZnO films against pathogenic Escherichia coli (E. coli) was tested in this study. Six different CuO-ZnO films were fabricated via electrophoretic deposition (EPD) with increasing CuO-ZnO weight ratio. E. coli bacteria media that were cultured in a petri dish were consequently exposed to the different ZnO-CuO films both with and without UV irradiation. Serial dilution method was used in determining the Colony Forming Unit (CFU) of the bacteria during the test for antibacterial activity. The films surface morphology and crystal structure were characterized using SEM and XRD analysis. In this study, among the CuO-ZnO films subjected to UV radiation, the film containing 1% CuO was found to be the most effective in inhibiting E. coli. Tests show that the addition of 1% CuO increased the antibacterial activity of the ZnO film, however, further addition of CuO (3%, 5% and 7%) reduced it. The results suggest that there is an optimum ratio between CuO and ZnO for inhibiting E. coli growth. Using the proper ratio induces the optimal transfer of holes and electrons between the two metal oxides semiconductor, which delays the recombination process and therefore increases the antibacterial performance of the film. The addition of CuO outside this optimum ratio may possibly reduce the generated transfer of holes from ZnO to CuO, and thus reduce the films antibacterial performance.

Language

English

Location

UPLB Main Library Special Collections Section (USCS)

Call Number

LG 993.5 2014 P51 B39

Document Type

Thesis

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