Robust Large Gap Two-Dimensional Topological Insulators in Hydrogenated III-V Buckled Honeycombs

Issue Date

2015

Abstract

A large gap two-dimensional (2D) topological insulator (TI), also known as a quantum spin Hall (QSH) insulator, is highly desirable for low-power-consuming electronic devices owing to its spin-polarized backscattering-free edge conducting channels. Although many freestanding films have been predicted to harbor the QSH phase, band topology of a film can be modified substantially when it is placed or grown on a substrate, making the materials realization of a 2D TI challenging. Here we report a first-principles study of possible QSH phases in 75 binary combinations of group III (B, Al, Ga, In, and Tl) and group V (N, P, As, Sb, and Bi) elements in the 2D buckled honeycomb structure, including hydrogenation on one or both sides of the films to simulate substrate effects. A total of six compounds (GaBi, InBi, TlBi, TlAs, TlSb, and TlN) are identified to be nontrivial in unhydrogenated case; whereas for hydrogenated case, only four (GaBi, InBi, TlBi, and TlSb) remains nontrivial. The band gap is found to be as large as 855 meV for the hydrogenated TlBi film, making this class of III-V materials suitable for room temperature applications. TlBi remains topologically nontrivial with a large band gap at various hydrogen coverages, indicating the robustness of its band topology against bonding effects of substrates.

Source or Periodical Title

Nano Letters

ISSN

1530-6984

Volume

15

Issue

10

Page

6568-6574

Document Type

Article

Language

English

Subject

2D topological insulators, electronic structures, first-principles calculations, III-V semiconductor thin films, quantum spin Hall effect, topological phase transition

Identifier

doi:10.1021/acs.nanolett.5b02293.

Digital Copy

yes

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