A centrifuge-type photoresist spincoater
Date
6-1997
Degree
Bachelor of Science in Applied Physics
College
College of Arts and Sciences (CAS)
Adviser/Committee Chair
Demetrio A Yco, Jr.
Abstract
A new technique was developed for the coating of substrates with a fluid such as phototresist. The instrument designed and implemented was based on the principles of a centrifuge. The spinning of the cylinder instrument produced centrifugal force which supplied the pressure for flattening out the fluid over the substrate. The effect of varying the angular velocity of the cylinder with the thickness of the film of fluid deposited was investigated. The results show that as the angular velocity of the cylinder is increased, the less mass is deposited on the substrate. The less mass deposited, the thinner is the film produced. The new method has produced thin films of ranges 30.71pm to 57.38pm,. The thinnest film produced was 8.28 pm. Quantitatively, the new technique is considered to be an effective method in growing thin films.
Language
English
Location
UPLB Main Library Special Collections Section (USCS)
Call Number
Thesis
Recommended Citation
Abelarde, Daniel H M, "A centrifuge-type photoresist spincoater" (1997). Undergraduate Theses. 10255.
https://www.ukdr.uplb.edu.ph/etd-undergrad/10255
Document Type
Thesis