A centrifuge-type photoresist spincoater

Date

6-1997

Degree

Bachelor of Science in Applied Physics

College

College of Arts and Sciences (CAS)

Adviser/Committee Chair

Demetrio A Yco, Jr.

Abstract

A new technique was developed for the coating of substrates with a fluid such as phototresist. The instrument designed and implemented was based on the principles of a centrifuge. The spinning of the cylinder instrument produced centrifugal force which supplied the pressure for flattening out the fluid over the substrate. The effect of varying the angular velocity of the cylinder with the thickness of the film of fluid deposited was investigated. The results show that as the angular velocity of the cylinder is increased, the less mass is deposited on the substrate. The less mass deposited, the thinner is the film produced. The new method has produced thin films of ranges 30.71pm to 57.38pm,. The thinnest film produced was 8.28 pm. Quantitatively, the new technique is considered to be an effective method in growing thin films.

Language

English

Location

UPLB Main Library Special Collections Section (USCS)

Call Number

Thesis

Document Type

Thesis

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