Polyaniline thin film via direct- current plasma enhanced chemical vapor deposition

Date

10-2008

Degree

Bachelor of Science in Applied Physics

College

College of Arts and Sciences (CAS)

Adviser/Committee Chair

Alvin Karlo G. Tapia

Co-adviser

Lou Serafin M. Lozada

Abstract

Polyaniline thin film was produced from monomer aniline as precursor reactant using plasma enhanced chemical vapor deposition (PECVD) with direct current (DC) power supply. Stainless steel (SST) and glass (Si0x) were used as substrates to observe the adherence of film deposit. The polymerization was carried out at different monomer filling pressures andat different partial pressures of argon. The film obtained were characterized using Fourier Transform Infrared spectroscopy—Attenuated Total Reflectance (FTIR-ATR) technique to confirm polyaniline structure. X-ray Diffraction Analysis (XRD) was done to investigate the crystallinity of the polymerized film. Field Effect Scanning Electron Microscope (FESEM) was used to examine the surface morphology of plasma polymerized polyaniline. FTIR spectra confirmed polymerization of aniline into polyaniline. Broadened IR spectra were obtained which is a feature characteristic of plasma polymers. IR analysis revealed dependence of polymer structures to monomer filling pressure. Structural units which are absent in 300 Pa were found at 200 Pa monomer filling pressure. Aliphatic strictures were found which implies that there are electrons with energy high enough to break aromatic ring structure of polyaniline. Depositions were observed on SST substrates while no distinguishable deposits were found on SiOx, substrate. XRD results imply amorphous stricture of PAni. FESEM micrographs at different magnifications show continuous and smooth surface morphology of the polyaniline film, a characteristic feature of plasma polymers.

Language

English

Location

UPLB Main Library Special Collections Section (USCS)

Call Number

Thesis

Document Type

Thesis

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