A kinetic Monte Carlo study on the role of defects and detachment in the formation growth of in chains on Si(100)
Issue Date
10-2009
Abstract
Deposition on a Si(100) surface and subsequent self-assembly of In atoms into one-dimensional (1D) atomic chains at room temperature is investigated via kinetic Monte Carlo simulation of a suitable atomistic model. Model development is guided by recent experimental observations in which 1D In chains nucleate effectively exclusively at C-type defects, although In atoms can detach from chains. We find that a monotonically decreasing form of the scaled island size distribution (ISD) is consistent with a high defect density which facilitates persistent chain nucleation even at relatively high coverages. The predominance of heterogeneous nucleation may be attributed to several factors including low surface diffusion barriers, a high defect density, and relatively weak In-In binding. © 2009 IOP Publishing Ltd.
Source or Periodical Title
Journal of Physics Condensed Matter
ISSN
0953-8984
Volume
21
Issue
40
Page
1-8
Document Type
Article
Physical Description
illustrations, tables, graphs
Language
English
Recommended Citation
Albao, M.A., Evans, J,W., Chuang, F.C. (2009). A kinetic Monte Carlo study on the role of defects and detachment in the formation and growth of In chains on Si(100). Journal of physics. Condensed matter : an Institute of Physics journal, 21 (40), 1-8. doi:10.1088/0953-8984/21/40/405002.
Identifier
doi:10.1088/0953-8984/21/40/405002.
Digital Copy
yes